Clean room

  • Salle blanche.
    Clean room. © Laurent Ardhuin pour Sorbonne Université

The Paris Institute of NanoSciences has a clean room. This structure opened its doors in October 2010. With its 170 m² of clean rooms, including 80 m² in ISO 6 cleanliness class (formerly class 1000, i.e. a certified controlled dust zone containing less than 1000 particles of 0.5 µm in diameter per foot3 of air) and 90 m² in ISO 7 class (class 10,000), this tool represents for the INSP an indispensable instrument in its research in the field of micro and nanotechnologies.
This micro-nano fabrication and characterization platform is an integral part of the consortium of clean rooms labeled “second circle Paris Centre” which includes five research entities: INSP, ENS, IPGG, Université Paris Cité (MPQ) and Observatoire de Paris.

This platform meets the needs of INSP members and is also open, upon request, to the scientific community and to companies.

The platform staff is in charge of welcoming and training users (researchers, PhD students, teachers, post-docs, students), advising and assisting researchers for the good realization of their scientific projects, maintaining and modernizing the equipment available, and enforcing the rules of use and safety inherent to such a facility.
This clean room allows the realization and characterization of micro and nanostructures specific to the different research fields developed within the INSP. Moreover, external projects can be hosted in this facility (for example, the realization of photolithography masks with the DWL).


Erwan Dandeu, Mohamad Hamieh, Emmanuel Lhuillier


Direct line: 01 44 27 81 32




Use the clean room

The entrance to the INSP clean room is located on the Jussieu campus, in the rotunda of tower 22, on the first floor (door 2223-SBC1, opposite the freight elevator).

Access map

The keys allowing direct access to the clean room are held only by the persons in charge of this platform. The room is not self-service.

For any manipulation envisaged in the clean room, it is thus imperative to make a reservation on the GRR schedule set up for this purpose or to contact beforehand one of the persons in charge (Erwan Dandeu, Mohamad Hamieh, Emmanuel Lhuillier) in order to agree on an appointment.

For obvious organizational reasons, all reservations on the GRR schedule must be made at least 24 hours in advance at this address:

On the day of the appointment, a person in charge will be present to give you access to the room and guide you through your experiments. An intercom located at the entrance of the clean room allows you to signal your presence to the people already present inside.

User’s guide (2019)


Equipment of the clean room

All the equipment necessary for basic manipulations is present on site. Ultra-pure water, as well as many acids, bases, solvents, resins, substrates and other consumables are available. However, for any particular request, please contact the persons in charge of the clean room.

Here are the main tools available to users:

Deposition equipment


  • 2 Joule effect evaporation frames (Edwards Auto 306 and Vinci PVD-4E)
  • 2 multi-target cathodic magnetron sputterers (Alcatel)
  • Sputtering (Biorad SC500)
Lithography equipment
  • 2 spin coater (Polos Spin 150 i)
  • UV laser direct write photolithography (DWL 66FS Heidelberg)
  • 2 mask aligners (MJB4 and MJB3 – Karl Süss)
  • Electronic lithography system (Raith Elphy Quantum)
Characterization equipment


  • SEM (Zeiss Supra 40) + EDS Detector (EDS Compact 30mm Brucker)
  • Optical microscope (Olympus BX51)
  • Mechanical profilometer (Dektak 150 Veeco)
Various equipments


  • 3 chemistry hoods for wet etching and various manipulations
  • Micro Diamond Scriber (OEG MR100)
  • Annealing/oxidation furnace (Carbolite BGHA12/300A)
  • Plasma cleaner (Harrick Plasma PDC-002)


Examples of achievements

Here are some examples of samples realized at INSP thanks to the equipment present in the clean room.

Manufacture of photolithography masks
Fabrication de masques de photolithographie A l’aide de la technique de photolithographie à écriture directe par laser UV (DWL 66FS Heidelberg), des masques aux motifs variés peuvent être réalisés sur demande.
Réalisation : Loïc Becerra, Mélanie Escudier
Phononic crystals
Dispositif de mesures différentielles de la vitesse du son dans les liquides

The modulation of acoustic properties at the scale of a hundred microns, at the origin of original behaviors, is obtained by etching holes in a silicon plate. Project author : Bernard Bonello

Cristaux phononiques

The modulation of acoustic properties at the micron scale is obtained by etching holes in a silica substrate.Project author : Laurent Belliard

Optical metamaterials
Méta-matériaux optiques The structuring of thin films allows to obtain new physical properties of materials for their use in optics.
Project author : Bruno Gallas
Multilayer deposition
Dépôt de multicouches Structuring of a thick multilayer system in the form of dots (collaboration with the Femto-ST technology center in Besançon for the use of the DRIE technique).
Project author : Bernard Bonello
Structuring of a GaMnAs thin film to obtain magnetic tracks or pads
Structuration d’une couche mince de GaMnAs pour obtention de pistes ou de plots magnétiques These structures allow the study of the structure and dynamics of magnetic domains, as well as the ultra-fast manipulation of magnetization.
Project author : Laura Thevenard
Surface acoustic transducers
Transducteurs acoustiques de surface Development of SAW type devices (inter-digitated emitter and receiver combs) for the study of magnetic thin films.
Project author : Jean-Yves Duquesne
Isolated or interacting nanostructures
Nanostructures isolées ou en interaction The confinement of acoustic waves in nanostructured systems allows to highlight a discretization of the vibrational landscape.
Project author : Laurent Belliard
Capteurs A gold contact system is lithographed on the sample to be studied in order to extract by the 3ω method the conductivity of the underlying films.
Project author : Jean-Yves Duquesne
Isolated or organized micron acoustic scatterers
Diffuseurs acoustiques microniques isolés ou organisés Under certain conditions, isolated nano and microstructures can interact with surface waves.
Project author : Laurent Belliard
Characterization of opal deposits by SEM
Caractérisation de dépôts d’opales par MEB Project author : Agnès Maitre
Self-suspended systems
Systèmes auto-suspendus The realization of systems without interaction with the substrate is often an advantage in the study of their intrinsic properties.
Project author : Laurent Belliard
Realization of electrodes
Réalisation d’électrodes After having located the sample to be studied on the surface of the substrate (here graphene), a system of electrodes was designed in order to perform transport measurements.
Project author : Abhay Shukla (IMPMC)
Self-suspended copper nanowires on microstructured silicon substrate
Nanofils de cuivre auto-suspendus sur substrat silicium micro-structuré By photolithography and KOH wet etching, a Si substrate has been micro-structured. On the trenches, copper nanowires were then dispersed in order to study their vibrational properties.
Project author : Laurent Belliard
Device for differential measurements of the speed of sound in liquids
Dispositif de mesures différentielles de la vitesse du son dans les liquides In order to measure sound in liquid systems, differential measurements are very relevant. In this case, structures have been etched in a transparent substrate.
Authors of the project : Laurent Belliard, Fréderic Decremps (IMPMC)


Person in charge: Laurent Belliard

Initiation to the different technologies related to the structuring of the material in clean room

Effects of rotation parameters during the coating of substrates, UV exposure parameters, development of positive or negative resins, chemical etching, anisotropic etching of silicon, lift-off process, thin film deposition, characterization techniques.

Teaching in the form of mini projects

The objective is to take advantage of the lithography processes in order to realize systems presenting functionalities that will have been introduced in the framework of more academic courses. The opening towards many UPMC training courses is under development (Research and Professional Masters, Internships) and should be amplified in the years to come.

Currently, two practical works, ranging from design to characterization of functional devices, are given in the clean room of the INSP:

Project 1: Fabrication of a simplified LCD cell
Etching ITO electrodes, manufacturing of the anchoring layers and study in polarization of the answer of the liquid crystal, characterization of the operation of the cell.
Project 2: Realization of an atomic force microscopy tip
Manufacturing of the support and the cantilever, realization of micro tips networks, characterization of the operation of the local probe.